Features and Benefits:
Performance
Large sample system with flexure tip scanner capable of atomic resolution.
Highest measurement stability with CleanDrive photothermal excitation.
WaveMode: Fastest off-resonance imaging for reproducible and fast measurements.
Versatility
Large scan range: 100 x 100 x 20 μm³.
Compatible with broad selection of nanoelectrical characterization methods (NEC), such as Nanosurf’s SMM solution.
Expandable functionality with accessories and software options.
Automation
Fully automated laser alignment and cantilever calibration.
Automated imaging on every region of interest within fully addressable XY sample area of 200 x 200 mm².
Accurate and consistent roughness measurements with WaveMode.
Obtaining Highest Resolution with a Large Scanner
Thanks to the superior technology of the DriveAFM scan head, imaging at atomic resolution is possible, even on this large-stage system.
This powerful combination allows for the observation of feature sizes covering several orders of magnitude, making a wide variety of structures accessible for analysis.
Technical Specifications:
Z-travel: 13 mm.
XY-travel : 200 mm.
XY repositioning accuracy :2 µm.
Sample platform size: 200 x 200 mm².
Sample size :Max. 200 x 200 x 10 mm³.
Sample weight: Max. 2 kg.
Vacuum chuck for : 4, 6, 8 inch wafer.
Stage technology: Stepper motor / belt / air bearings.
Z-noise (RMS dynamic mode) : < 20 pm, VC-G.
Acoustic isolation STC rating : 48.
Vibration isolation : Active damping.
Floor vibration requirements: VC-E or better.