HiPulse 110M HiPIMS Pulse Generator for Magnetron Sputtering

Advanced pulse control for thin-film deposition

HiPIMS is an advanced magnetron sputtering technique in which the target is driven by short, high-power electrical pulses. These pulses produce an intense plasma and a high degree of ionisation of the sputtered material, providing additional control over the energy and flux of the particles reaching the substrate.

Compared with conventional DC magnetron sputtering, HiPIMS can support the development of films with improved density, adhesion, uniformity and structural control. Final results nevertheless depend on the target material, substrate, magnetron geometry, process gas, working pressure, substrate bias and selected pulse parameters.

The HiPulse 110M provides the flexibility required to investigate these relationships and move from pulse durations of 2 µs or more through to continuous DC operation.

Key features

Pulse generator and modulator for HiPIMS processes;

Operates with a compatible DC power supply;

DC input voltage from 50 to 1,200 V;

Adjustable pulse output voltage from −50 to −1,200 V;

Peak pulse output power up to 14 kW;

Maximum pulse output current of 12 A;

Minimum pulse duration of 2 µs;

Operation from short pulses through to DC mode;

Adjustable operating frequency from 100 Hz to 10 kHz;

Active arc control for improved discharge stability;

Touchscreen interface for parameter configuration and monitoring;

BNC voltage and current monitoring outputs;

Air-cooled design;

Compact construction weighing less than 9 kg;

CE marking;

Configuration and integration support from APEL Laser.

Process-development benefits

Flexible pulse control

Pulse duration can be adjusted from a minimum of 2 µs through to DC operation, allowing different discharge regimes to be compared on a common experimental platform.

Improved discharge stability

Active arc control helps manage instabilities under demanding plasma conditions and at elevated peak currents.

External waveform monitoring

BNC outputs allow the voltage and current signals to be monitored using an oscilloscope or a compatible data-acquisition system.

Adaptation to different materials and magnetrons

Voltage, frequency and pulse duration can be configured according to the target material, magnetron dimensions and process objectives.

Integration into existing equipment

APEL Laser can assess the DC power supply, magnetron cathode, electrical connections, interlocks and process requirements before defining the final configuration.

Technical specifications — HiPulse 110M

Electrical supply and DC input

Pulse output

Interface and monitoring

Physical and environmental characteristics

Applications and industry insights

Thin-film research and process development

The HiPulse 110M can be used to investigate how pulse duration, frequency, voltage and current influence plasma behaviour and deposited-film properties. External waveform monitoring supports correlation between pulse characteristics, discharge stability and process results.

Hard and wear-resistant coatings

HiPIMS is relevant to the development of coatings for tools, mechanical components and wear-exposed surfaces where film density, adhesion and microstructural control are important.

Optical and functional coatings

The platform can support research into optical, reflective, absorbing, conductive and other functional thin films. The system configuration must be adapted to the target material and required coating properties.

Microelectronics and semiconductors

The generator can be incorporated into experimental platforms for developing metallic layers, nitrides, oxides and other materials used in semiconductor and microelectronics research.

Nanotechnology and advanced materials

The HiPulse 110M supports research into the relationship between plasma parameters, nucleation, morphology, density and the structure of thin or nanostructured films.

Sensors and functional devices

Potential uses include the development of thin-film structures for sensors, electronic devices, optical components and other functional devices.

Process development with metallic targets

The brochure presents HiPIMS discharges using 1-inch copper and titanium targets, demonstrating stable operation and material-dependent differences in plasma appearance. Other target materials and magnetron dimensions require configuration review and process optimisation.

Integration into a magnetron sputtering system

The HiPulse 110M is not a standalone DC power supply. It modulates the output of a compatible DC source and is available only as part of a configuration that includes such a source.

Before defining the configuration, APEL Laser can assess:

DC supply power and voltage;

magnetron type and dimensions;

high-voltage connections and polarity;

required process voltage and current;

equipment interlocks;

protective earth and electrical safety;

cathode and system cooling;

process gases and operating pressure;

waveform monitoring and data-acquisition requirements.

The final configuration is determined according to the equipment, magnetron, target materials and process objectives.

Frequently asked questions

What is a HiPIMS generator?

A HiPIMS generator supplies short, high-power electrical pulses to a magnetron cathode. These pulses produce an intense, highly ionised plasma used for thin-film deposition research and process development.

Can the HiPulse 110M operate without a DC power supply?

No. The HiPulse 110M operates together with a compatible DC source and is available only in a configuration that includes such a power supply.

Can it be retrofitted to an existing sputtering system?

Yes, provided that the DC supply, magnetron, electrical connections and safety systems are compatible. APEL Laser can perform a technical assessment before specifying the configuration.

What is its peak pulse output power?

According to the HiPulse 110M brochure, the peak pulse output power is 14 kW.

What is the maximum pulse current?

The maximum pulse output current is 12 A.

What is the minimum pulse duration?

The minimum pulse duration is 2 µs. The operating range can be extended through to DC mode.

What operating-frequency range is available?

The operating frequency can be adjusted from 100 Hz to 10 kHz.

How are voltage and current monitored?

BNC outputs are provided for monitoring the voltage and current waveforms with an oscilloscope or compatible data-acquisition system.

Which target materials have been demonstrated?

The brochure presents discharge tests using 1-inch copper and titanium targets. Compatibility with other target materials and magnetron sizes should be assessed for each installation.

Can the HiPulse 110M be used in industrial production?

The platform was developed for real-world research and industrial applications. Production integration requires validation of the duty cycle, process stability, cooling and compatibility with the complete deposition system.

Is integration support available?

APEL Laser can supply the compatible DC power source, assess the installation and provide the interfaces and technical support required for integration into a new or existing sputtering system.

Configure the HiPIMS system for your deposition equipment

Send us information about your DC supply, magnetron cathode, target materials, substrate dimensions and process requirements. The APEL Laser team can evaluate compatibility and propose an appropriate configuration.

https://apellaser.ro/en/contact/