High Power Pulsed Generators for Reliable Magnetron Sputtering

Why HiPiMS

• Improved film density and adhesion;

• Enhanced coating uniformity;

• Precise control of film thickness and structure;

• Reduced substrate damage;

• High energy efficiency and reduced process costs;

• Lower environmental impact.

General Features

• Available only together with the power supply;

• Adjustable maximum voltage (≤ 1200 V);

• Customizable pulse duration (2 µs – DC);

• Plug-and-play configuration;

• Active arc control.

Technical Specifications – HiPulse 110M Series

• Power supply: 230 V, 60 Hz ±10%, PE

• DC input power: 1 W – 600 W

• DC input voltage: 50 V – 1200 V

• DC input current: 1 mA – 1000 mA (max.)

• Putere de ieșire în impuls: 60 kW (vârf)

• DC input voltage: 50 V – 1200 V

• Pulse output power: 60 kW (peak)

• Pulse duration: ≥ 2 µs

• Operating frequency: 100 Hz – 10 kHz

• User interface: Touchscreen display

• Voltage monitoring output (pulse): BNC, 12 V (max.)

• Current monitoring output (pulse): BNC, 3 V (max.)

• Weight: < 9 kg

Environmental Specifications – HiPulse 110M Series

• Operating temperature: +5 °C to +40 °C

• Storage temperature: –25 °C to +55 °C

• Relative humidity: max. 85%, non-condensing

• Cooling: air-cooled

• Compliance: CE marked