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Epitaxial Reactor Systems | Thermco Systems
Available configurations:
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EpiPro 5000: manually loaded dual-reactor with induction coil heating and single-switching RF generator
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EpiPro 5000IG: manually loaded with dual-reactor and dedicated RF generator per reactor for higher throughput
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EpiPro 8000: automated dual-reactor with induction heating and single RF generator
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EpiPro 8000IG: automated dual-reactor with dedicated RF per reactor for maximum throughput
All models feature an upgraded PLC control system with a Windows-based touchscreen GUI and include a SECS/GEM interface.
Description
The EpiPro family of systems addresses industry needs for high-throughput processing and low cost-of-ownership in silicon epitaxy. These dual-station batch solutions are designed for today’s production demands, offering both manual load/unload and fully automated wafer handling.
Design highlights include:
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High process flexibility; P and N doped materials
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Substrate sizes from 100–200 mm
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EPI layer thickness from < 5 µm to > 100 µm
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Resistivity range from 0.02 Ω cm to 50 Ω cm
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Dual-process chamber systems
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IG versions with dual RF supply for induction heaters
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Low cost-of-ownership and unique dopant injection system
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Patented chamber features
Additional information
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