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These lasers extend the self-contained OBIS concept into the UV, including 349 nm and 320 nm, which are ideal for the latest UV fluorochromes. Low-noise UV lasers that are ideal for OEM instrumentation applications in flow cytometry, confocal microscopy, and semiconductor inspection. Control electronics are integrated within the laser head. OBIS XT models generate very low thermal load.
Resources:
Featuring superior performance and reliability within an industryleading compact package, the OBIS LG is the ideal solution for your OEM instrumentation needs.
Features & Benefits:
Up to 50 mW output power at 355 nm;
TEM00 power-invariant beam;
Low noise;
PermAlignâ„¢ technology;
Integrated control electronics;
Technical Specifications:
OBIS 320 XT:
Wavelength (nm): 320.2.
Output Power Options (mW) : 20, 40.
Beam Quality (M2): ≤1.1.
OBIS 349 XT:
Wavelength (nm): 348.8 .
Output Power Options (mW) : 20, 60, 100, 150.
Beam Quality (M2): ≤1.1.
OBIS LG 355:
Wavelength (nm): 355±2 .
Output Power Options (mW) : 20, 50
Beam Quality (M2): ≤1.2 .
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Our team is here to help you! Call us or leave us a message and an Apel Laser consultant will be happy to answer your questions and find personalized solutions for you.