{"id":20420,"date":"2023-07-23T18:24:06","date_gmt":"2023-07-23T15:24:06","guid":{"rendered":"https:\/\/apellaser.ro\/product\/phase-contrast-microscopes-euromex\/"},"modified":"2023-11-22T13:20:41","modified_gmt":"2023-11-22T11:20:41","slug":"phase-contrast-microscopes-euromex","status":"publish","type":"product","link":"https:\/\/apellaser.ro\/en\/product\/phase-contrast-microscopes-euromex\/","title":{"rendered":"UV Plasma sources UVS 10\/35 and UVS300 | Horiba"},"content":{"rendered":"<p>Model :UVS 10\/35<br \/>\nType : Plasma source<br \/>\nSupported gases : He \u2013 H &#8211; Ne \u2013 Ar \u2013 Kr &#8211; Xe.<br \/>\nVacuum flange: DN40CF<br \/>\nCooling: Air cooled<br \/>\nSource point diameter : few mm.<br \/>\nFlux: 8.1015 photons\/sr.s.<br \/>\nOverall length: 245 mm.<br \/>\nWeight: 3 kg<br \/>\nPower supply: Included in the package<\/p>\n<p>Model :UVS300<br \/>\nType : Duo plasmatron source.<br \/>\nSupported gases : He \u2013 H \u2013 Ne &#8211; Ar.<br \/>\nVacuum flange: DN40CF.<br \/>\nCooling: Water cooled.<br \/>\nSource point diameter : 50 \u00b5m<br \/>\nFlux: 2.1016 photons\/sr.s.<br \/>\nOverall length: 305 mm.<br \/>\nWeight: 12 kg<br \/>\nPower supply: Included in the package<\/p>\n","protected":false},"excerpt":{"rendered":"<p>The UVS300 and UVS 10\/35 are UV Plasma sources with high intensity, working with different gases.<\/p>\n<p><strong>Resources:<\/strong><\/p>\n<p><a href=\"https:\/\/www.horiba.com\/int\/products\/detail\/action\/show\/Product\/uv-plasma-sources-1616\/\" target=\"_blank\" rel=\"noopener\"><button class=\"buton-resurse\">Manufacturer<\/button><\/a><\/p>\n","protected":false},"featured_media":23334,"template":"","meta":[],"product_brand":[],"product_cat":[2578],"product_tag":[],"class_list":{"0":"post-20420","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-light-sources","7":"pa_aplicatii-industrii-analysis-and-characterization-of-compounds-and-materials-with-uv-absorption-properties","8":"pa_aplicatii-industrii-materials-processing-industry-en-2","9":"pa_aplicatii-industrii-modification-of-surfaces","10":"pa_aplicatii-industrii-photolithography","11":"pa_aplicatii-industrii-photoluminescence-en","12":"pa_aplicatii-industrii-spectroscopy","13":"pa_aplicatii-industrii-uv-polymerization","14":"pa_producator-horiba-en","15":"pa_putere-200-w-en","16":"pa_putere-300-w-en","17":"pa_tip-sursa-lumina-uv-plasma-en","19":"first","20":"instock","21":"product-type-simple"},"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.4 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>UV Plasma sources UVS 10\/35 and UVS300 | Horiba - APEL LASER<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/apellaser.ro\/en\/product\/phase-contrast-microscopes-euromex\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"UV Plasma sources UVS 10\/35 and UVS300 | Horiba - APEL LASER\" \/>\n<meta property=\"og:description\" content=\"The UVS300 and UVS 10\/35 are UV Plasma sources with high intensity, working with different gases.  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