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https://apellaser.ro/wp-content/uploads/2023/07/OBIS-LG-Lasers-_1-1.jpeg-1.jpeg600600These lasers extend the self-contained OBIS concept into the UV, including 349 nm and 320 nm, which are ideal for the latest UV fluorochromes. Low-noise UV lasers that are ideal for OEM instrumentation applications in flow cytometry, confocal microscopy, and semiconductor inspection. Control electronics are integrated within the laser head. OBIS XT models generate very low thermal load. Resources: BrochureManufacturer