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Spin Process Stations | SPS Europe
Spin Process Stations is an versatile platform that you can used for a wide range of processes. Based on the proven high quality POLOS single substrate spin coater, the modular design Spin process station provides excellent value for money: full plastic construction, with high-end components, compatible with any chemical environment in a modular set-up, suitable for your specific requirement. The seamless integration of polypropylene (optional PTFE) Spin processor in the base station allows you to work with all kinds of chemicals. In the station housing various modules can be incorporated and centrally controlled for supply of chemicals and gases.
Resources:
Description
Features & Benefits:
Process applicable to 100 mm, 150 mm and 200 mm wafers with minimum conversion time (less than 15 minutes)
Chemicals.
KOH.
HNO3.
/HF/CH₃COOH (HNA).
Continuous wafer rotation
Puddle mode
Dispense position and mode:
– Fix position
– Oscillating movement over a specific distance (wafer diameter).
Spray dispense.
Flush dispense.
Technical Specifications:
Available number of programs: 50.
Steps per program: 100.
Spin speed*: 1 – 10,000 rpm** ± 1rpm steps.
Spin speed accuracy: ± 0.1 rpm **.
Spin rotational direction : Clockwise, Counter clockwise.
Max. acceleration: 30,000 rpm/sec.
Acceleration accuray: ± 0.1 rpm/sec.
Spin speed read out accuray: ± 0.1 rpm.
System data
Interface: Keyboard and LCD full size display, chemical resistant, IP50.
Tank model: 2x NPP process tank, 10 L effective volume.
Utilities: DIW spray gun, N2 spray gun, vacuum wand, front light indicators.
Chamber diameter: 402 mm.
Dimension (desktop version): 1400 (w) x 1600 (h) x 950 (d) mm.
Safety : Leak sensor, drain sensor, ShutDown supply valve.
Additional information
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